China has built a prototype EUV (extreme ultraviolent) lithography machine in a high-security laboratory in Shenzhen. They ...
B, the first High-NA EUV lithography tool designed for commercial production, reiterating Intel's plans to use High-NA EUV patterning for 14A process technology and onwards.
China Completes EUV Prototype in Manhattan Project Push Prototype, part of Chinese Manhattan Project, faces precision and ...
IMEC has successfully demonstrated the full wafer-scale fabrication of nanopores using ASML’s state-of-the-art extreme ...
According to a report from Tom's Hardware, China's so-called "Frankenstein" EUV scanner was assembled from mismatched parts sourced through various channels, potentially including surplus equipment ...
An investigation reveals how far China's own chip manufacturing has progressed. The technology of world market leader ASML ...
China just pushed the semiconductor fight into a new chapter. Inside a sealed compound in Shenzhen, scientists built a prototype EUV lithography machine that ...
Intel recently confirmed the latest results in its partnership with ASML. The US chipmaker worked with engineers from the European corporation to install, test, and validate ...
ASML Holding N.V. ASML is set to deliver another year of solid growth, with its Extreme Ultraviolet (“EUV”) sales anticipated to increase about 30% in 2025. This optimistic expectation is driven by ...
US startup aims to develop free-electron lasers directly emitting EUV light, in place of today’s laser-driven plasma systems. xLight, a US startup aiming to commercialize particle accelerator driven ...