B, the first High-NA EUV lithography tool designed for commercial production, reiterating Intel's plans to use High-NA EUV ...

China is now accused of doing what Washington spent years trying to prevent: building its own version of the world’s most ...

Key opportunities in the market include the growing demand for EUV technology for miniaturization in semiconductors, the rise of 3D ICs enhancing device performance, increased applications in ...

Intel’s comeback in cutting edge manufacturing is no longer a vague roadmap, it now revolves around a single, spectacular ...

China is reportedly testing a domestically developed EUV lithography machine, marking a major milestone in the country’s long ...

A team of boffins lead by Professor Tsumoru Shintake of the Okinawa Institute of Science and Technology (OIST) has unveiled a groundbreaking and significantly simplified EUV lithography tool, poised ...

Naura Technology, which has been actively acquiring and restructuring since 2015, is gradually assembling a comprehensive supply chain system for domestic semiconductor equipment in China. The most ...

OAKLAND, Calif. (Reuters) - Silicon Valley-based Applied Materials Inc, among the most important makers of tools for chip manufacturing, said on Tuesday it has started selling a new tool that can ...

Intel's Oregon team has accomplished a significant feat, assembling its first High NA EUV lithography tool. This cutting-edge technology is set to be operational within the year. The machine, costing ...

Nvidia has developed a software library for computational lithography, which it believes will massively improve chip design development times, and reduce the number of data centers chip fabs have to ...

Intel has completed the assembly of its High Numerical Aperture NA Extreme Ultraviolet (High NA EUV) lithography tool at the company’s R&D site in Hillsboro, Oregon. Built by ASML and delivered in ...

For IC design at the 90- and 65-nm process nodes to be truly successful, the design process needs more predictability built into it in terms of yield. The problem, to a large extent, is that there has ...